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A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers
Publication:
A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers
Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Frederik
;
Baklanov, Mikhaïl
;
Ciofi, Ivan
;
Detavernier, Christophe
;
Van Der Voort, Pascal
;
Van Driessche, Isabel
Journal
Chemical Communications
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1903
since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations
Metrics
Views
1903
since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations