Publication:
A 65-nm node SRAM solution using alt-PSM with ArF lithography
Date
| dc.contributor.author | Driessen, Frank | |
| dc.contributor.author | Zawadzki, Mary T. | |
| dc.contributor.author | Krishnan, Prakash R. | |
| dc.contributor.author | Balasinski, Artur | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.date.accessioned | 2021-10-15T13:17:14Z | |
| dc.date.available | 2021-10-15T13:17:14Z | |
| dc.date.issued | 2004-05 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8862 | |
| dc.source.beginpage | 224 | |
| dc.source.conference | Design and Process Integration for Microelectronic Manufacturing II | |
| dc.source.conferencedate | 22/02/2004 | |
| dc.source.conferencelocation | Santa Clara, CA USA | |
| dc.source.endpage | 234 | |
| dc.title | A 65-nm node SRAM solution using alt-PSM with ArF lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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