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Improvement of EUV Contact Hole Pattern Rectification using Novel Directed Self-Assembly Materials

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dc.contributor.authorKim, Dong-Ook
dc.contributor.authorKim, Jihoon
dc.contributor.authorKang, Namgoo
dc.contributor.authorHer, Youngjun
dc.contributor.authorMiyazaki, Shinji
dc.contributor.authorAlperson, Boaz
dc.contributor.imecauthorHer, Youngjun
dc.date.accessioned2025-07-31T03:59:32Z
dc.date.available2025-07-31T03:59:32Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051492
dc.identifier.eisbn978-1-5106-8641-0
dc.identifier.isbn978-1-5106-8640-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45976
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on Novel Patterning Technologies
dc.source.conferencedateFEB 24-27, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages7
dc.source.volume13427
dc.title

Improvement of EUV Contact Hole Pattern Rectification using Novel Directed Self-Assembly Materials

dc.typeProceedings paper
dspace.entity.typePublication
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