Publication:

Process-induced positive charges in Hf-based gate stacks

Date

2008
Journal article
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16760.pdf 1.04 MB

Author(s)

Zhao, C.Z.
;
Zhang, J.F.
;
Chang, M.H.
;
Peaker, A.R.
;
Hall, S.
;
Groeseneken, Guido  
;
Pantisano, Luigi
;
De Gendt, Stefan  
;
Heyns, Marc  

Journal

Journal of Applied Physics

Abstract

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1987 since deposited on 2021-10-17
3last month
Acq. date: 2026-04-06

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1987 since deposited on 2021-10-17
3last month
Acq. date: 2026-04-06

Citations