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Biaxial and uniaxial compressive stress implemanted in Ge(Sn) pMOSFET channels by advanced reduced pressure chemical vapor deposition developments
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1963 since deposited on 2021-10-19
Acq. date: 2025-12-08
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1963 since deposited on 2021-10-19
Acq. date: 2025-12-08
Citations