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Intra-die temperature non uniformity related to front side emissivity depandence during rapid thermal annealing

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dc.contributor.authorLaviron, C.
dc.contributor.authorLindsay, Richard
dc.contributor.authorMichallet, A.
dc.contributor.authorHalimaoui, A.
dc.contributor.authorGranneman, E.
dc.date.accessioned2021-10-15T05:20:05Z
dc.date.available2021-10-15T05:20:05Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7786
dc.source.beginpage3
dc.source.conferenceAdvanced Short-Time Thermal Processing for Si-Based CMOS Devices
dc.source.conferencedate28/04/2003
dc.source.conferencelocationParis France
dc.source.endpage10
dc.title

Intra-die temperature non uniformity related to front side emissivity depandence during rapid thermal annealing

dc.typeProceedings paper
dspace.entity.typePublication
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