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Analysis of the performance of a micromechanical test structure to measure stress in thick electroplated metal films

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dc.contributor.authorSmith, S.
dc.contributor.authorBrockie, N. L.
dc.contributor.authorMurray, J.
dc.contributor.authorWilson, Chris
dc.contributor.authorHorsfall, A. B.
dc.contributor.authorTerry, J. G.
dc.contributor.authorStevenson, J. T. M.
dc.contributor.authorMount, A. R.
dc.contributor.authorWalton, A. J.
dc.contributor.imecauthorWilson, Chris
dc.date.accessioned2021-10-18T21:43:26Z
dc.date.available2021-10-18T21:43:26Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18005
dc.source.beginpage80
dc.source.conferenceIEEE International Conference on Microelectronic Test Structures - ICMTS
dc.source.conferencedate23/03/2010
dc.source.conferencelocationHiroshima Japan
dc.source.endpage85
dc.title

Analysis of the performance of a micromechanical test structure to measure stress in thick electroplated metal films

dc.typeProceedings paper
dspace.entity.typePublication
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