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Development, optimization and evaluation of a CF4 pretreatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications
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1917 since deposited on 2021-10-18
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Acq. date: 2025-12-08
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Views
1917 since deposited on 2021-10-18
2last month
2last week
Acq. date: 2025-12-08
Citations