Publication:

Special Section Guest Editorial: Design Technology Co-Optimization

Date

2026
Editorial Material
https://doi.org/10.1117/1.jmm.25.2.021001
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0009-0002-3327-5169
cris.virtualsource.department3133fd1f-edd3-4f57-83bd-255a85992bcd
cris.virtualsource.orcid3133fd1f-edd3-4f57-83bd-255a85992bcd
dc.contributor.authorWang, Lynn T. -N.
dc.contributor.authorKim, Ryan Ryoung Han
dc.date.accessioned2026-11-05T15:11:18Z
dc.date.available2026-11-05T15:11:18Z
dc.date.createdwos2026
dc.date.issued2026
dc.identifier.doi10.1117/1.jmm.25.2.021001
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/60749
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage021001
dc.source.endpage021001
dc.source.issue2
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages1
dc.source.volume25
dc.title

Special Section Guest Editorial: Design Technology Co-Optimization

dc.typeEditorial material
dspace.entity.typePublication
imec.internal.crawledAt2026-09-07
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-09-07
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