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Towards the understanding of intrinsic degradation and breakdown of SiOCH low-k dielectrics

Date

2014
Proceedings Paper
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dc.contributor.authorWu, Chen
dc.contributor.authorLi, Yunlong
dc.contributor.authorBarbarin, Yohan
dc.contributor.authorCiofi, Ivan
dc.contributor.authorTang, Baojun
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorCroes, Kristof
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.accessioned2021-10-22T08:27:39Z
dc.date.available2021-10-22T08:27:39Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24836
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6860611&contentType=Conference+Publications
dc.source.beginpage3A.2.1
dc.source.conferenceIEEE International Reliability Physics Symposium - IRPS
dc.source.conferencedate1/06/2014
dc.source.conferencelocationWaikoloa, HI USA
dc.source.endpage3A.2.6
dc.title

Towards the understanding of intrinsic degradation and breakdown of SiOCH low-k dielectrics

dc.typeProceedings paper
dspace.entity.typePublication
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