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In situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements

Date

1995
Proceedings Paper
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dc.contributor.authorSchmidt, Harald
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T13:16:11Z
dc.date.available2021-09-29T13:16:11Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/854
dc.source.beginpage316
dc.source.conferenceALTECH 95: Analytical Techniques for Semiconductor Materials and Process Characterization II. Proceedings of the Satellite Sympo
dc.source.conferencedate28/09/1995
dc.source.conferencelocationDen Haag The Netherlands
dc.source.endpage327
dc.title

In situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements

dc.typeProceedings paper
dspace.entity.typePublication
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