Publication:

Progress towards passivation of Ge/high-k interfaces

Date

2009
Meeting abstract
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dc.contributor.authorHoussa, Michel
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorMitard, Jerome
dc.contributor.authorDelabie, Annelies
dc.contributor.authorBellenger, Florence
dc.contributor.authorMeuris, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorStesmans, Andre
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-17T22:58:48Z
dc.date.available2021-10-17T22:58:48Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15493
dc.source.beginpageC6.1
dc.source.conferenceMRS Spring Meeting symposium C: CMOS Gate Stack Scaling - Materials, Interfaces, and Reliability Implications
dc.source.conferencedate13/04/2009
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Progress towards passivation of Ge/high-k interfaces

dc.typeMeeting abstract
dspace.entity.typePublication
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