Publication:

EUV mask defectivity study by existing DUV tools and new EBEAM technology

Date

2010
Presentation
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dc.contributor.authorMangan, Shmoolik
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorRozentsvige, Moshe
dc.contributor.authorKudriashov, Vladislav
dc.contributor.authorShoval, Lior
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorEnglard, Ilan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorSantoro, Gaetano
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-18T18:44:19Z
dc.date.available2021-10-18T18:44:19Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17567
dc.source.conferenceSPIE Photomask Technology
dc.source.conferencedate13/09/2010
dc.source.conferencelocationMonterey, CA USA
dc.title

EUV mask defectivity study by existing DUV tools and new EBEAM technology

dc.typeOral presentation
dspace.entity.typePublication
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