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Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis
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Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis
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Date
2011
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tomida, Kazuyuki
;
Popovici, Mihaela Ioana
;
Swerts, Johan
;
Wang, Mugwort
;
Kaczer, Ben
;
Pawlak, Malgorzata
;
Van Elshocht, Sven
;
Kim, Min-Soo
;
Debusschere, Ingrid
;
Afanasiev, Valeri
;
Altimime, Laith
;
Kittl, Jorge
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1895
since deposited on 2021-10-19
Acq. date: 2025-12-10
Citations
Metrics
Views
1895
since deposited on 2021-10-19
Acq. date: 2025-12-10
Citations