Publication:

CMOS-compatible dielectric constant engineering by embedding metallic particles in aluminum oxide

Date

2013
Journal article
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dc.contributor.authorPut, Brecht
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSwerts, Johan
dc.contributor.authorRooyackers, Rita
dc.contributor.authorTielens, Hilde
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.contributor.imecauthorPut, Brecht
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.accessioned2021-10-21T11:08:51Z
dc.date.available2021-10-21T11:08:51Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn2162-8726
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22962
dc.identifier.urlhttp://ssl.ecsdl.org/content/2/1/N1.full.pdf+html
dc.source.beginpageN1
dc.source.endpageN3
dc.source.issue1
dc.source.journalECS Solid State Letters
dc.source.volume2
dc.title

CMOS-compatible dielectric constant engineering by embedding metallic particles in aluminum oxide

dc.typeJournal article
dspace.entity.typePublication
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