Publication:

H2S molecular beam passivation of Ge(001)

Date

2011
Journal article
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dc.contributor.authorMerckling, Clement
dc.contributor.authorChang, Yao-Chung
dc.contributor.authorLu, Chung-Yu
dc.contributor.authorPenaud, Julien
dc.contributor.authorEl-Kazzi, Mario
dc.contributor.authorBellenger, Florence
dc.contributor.authorBrammertz, Guy
dc.contributor.authorHong, Minghwei
dc.contributor.authorKwo, Raynien
dc.contributor.authorMeuris, Marc
dc.contributor.authorDekoster, Johan
dc.contributor.authorHeyns, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorDekoster, Johan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-19T16:16:18Z
dc.date.available2021-10-19T16:16:18Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19418
dc.source.beginpage399
dc.source.endpage402
dc.source.issue4
dc.source.journalMicroelectronic Engineering
dc.source.volume88
dc.title

H2S molecular beam passivation of Ge(001)

dc.typeJournal article
dspace.entity.typePublication
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