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Pattern collapse and particle removal forces of interest to semiconductor fabrication process

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dc.contributor.authorKim, Tae-Gon
dc.contributor.authorWostyn, Kurt
dc.contributor.authorPark, Jin-Goo
dc.contributor.authorMertens, Paul
dc.contributor.authorBusnaina, Ahmed
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.accessioned2021-10-17T23:27:45Z
dc.date.available2021-10-17T23:27:45Z
dc.date.issued2009
dc.identifier.issn1662-9779
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15599
dc.identifier.urlwww.scientific.net
dc.source.beginpage47
dc.source.endpage50
dc.source.journalSolid State Phenomena
dc.source.volume145-146
dc.title

Pattern collapse and particle removal forces of interest to semiconductor fabrication process

dc.typeJournal article
dspace.entity.typePublication
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