Publication:

Understanding EUV resist dissolution characteristics and its impact to RLS limitations

Date

2011
Proceedings Paper
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dc.contributor.authorFonseca, Carlos
dc.contributor.authorHead, Brian H.
dc.contributor.authorShite, Hideo
dc.contributor.authorNafus, Kathleen
dc.contributor.authorGronheid, Roel
dc.contributor.authorWinroth, Gustaf
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-19T13:34:32Z
dc.date.available2021-10-19T13:34:32Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18919
dc.source.beginpage796911
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
dc.title

Understanding EUV resist dissolution characteristics and its impact to RLS limitations

dc.typeProceedings paper
dspace.entity.typePublication
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