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Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface

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2014 since deposited on 2021-09-30
1last month
Acq. date: 2025-12-16

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2014 since deposited on 2021-09-30
1last month
Acq. date: 2025-12-16

Citations