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Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface
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Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface
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Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Boullart, Werner
;
Mannaert, Geert
;
Graham, S.
;
Tarassenko, C.
;
Mouche, Laurent
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2014
since deposited on 2021-09-30
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Acq. date: 2025-12-16
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Metrics
Views
2014
since deposited on 2021-09-30
1
last month
Acq. date: 2025-12-16
Citations