Direct correlation between mask registration and on-wafer measurements for individual logic device features

dc.contributor.author	van Haren, Richard J. F.
dc.contributor.author	Steinert, Steffen
dc.contributor.author	Mouraille, Orion
dc.contributor.author	Kasperkiewicz, Ewa
dc.contributor.author	Hermans, Jan
dc.contributor.author	Hasan, Mahmudul
dc.contributor.author	van Dijk, Leon
dc.contributor.author	Beyer, Dirk
dc.contributor.imecauthor	Hermans, Jan
dc.contributor.imecauthor	Hasan, Mahmudul
dc.contributor.orcidimec	Hermans, Jan::0000-0003-1249-8902
dc.date.accessioned	2023-04-28T10:19:40Z
dc.date.available	2023-02-15T03:23:35Z
dc.date.available	2023-02-16T11:38:41Z
dc.date.available	2023-04-28T10:19:40Z
dc.date.issued	2022
dc.identifier.doi	10.1117/12.2641618
dc.identifier.eisbn	978-1-5106-5642-0
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/41097
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	Art. 122930L
dc.source.conference	Photomask Technology Conference
dc.source.conferencedate	SEP 26-29, 2022
dc.source.conferencelocation	Monterey
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	12
dc.source.volume	12293
dc.title	Direct correlation between mask registration and on-wafer measurements for individual logic device features
dc.type	Proceedings paper
dspace.entity.type	Publication
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