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Observation and characterization of defects in HfO2 High-K gate dielectric layers
Publication:
Observation and characterization of defects in HfO2 High-K gate dielectric layers
Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kaushik, Vidya
;
Claes, Martine
;
Delabie, Annelies
;
Van Elshocht, Sven
;
Richard, Olivier
;
Conard, Thierry
;
Rohr, Erika
;
Witters, Thomas
;
Caymax, Matty
;
De Gendt, Stefan
;
Heyns, Marc
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1976
since deposited on 2021-10-15
Acq. date: 2025-10-24
Citations
Metrics
Views
1976
since deposited on 2021-10-15
Acq. date: 2025-10-24
Citations