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Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition

Date

2010
Proceedings Paper
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dc.contributor.authorMortet, Vincent
dc.contributor.authorZhang, L.
dc.contributor.authorEckert, M.
dc.contributor.authorSoltani, A.
dc.contributor.authorD'Haen, Jan
dc.contributor.authorDouhéret, O.
dc.contributor.authorMoreau, Myriam
dc.contributor.authorOsswald, Sebastian
dc.contributor.authorNeyts, E.
dc.contributor.authorTroadec, D.
dc.contributor.authorWagner, Patrick
dc.contributor.authorBogaerts, A.
dc.contributor.authorVan Tendeloo, S.
dc.contributor.authorHaenen, Ken
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.date.accessioned2021-10-18T19:18:54Z
dc.date.available2021-10-18T19:18:54Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17656
dc.source.beginpage1203-J05-03
dc.source.conferenceDiamond Electronics and Bioelectronics - Fundamentals to Applications III
dc.source.conferencedate30/11/2009
dc.source.conferencelocationBoston, MA USA
dc.title

Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition

dc.typeProceedings paper
dspace.entity.typePublication
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