Publication:

Impact of mask line roughness in EUV lithography

Date

2011
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorGraves, Trey
dc.contributor.authorSmith, Mark D.
dc.contributor.authorBiafore, John
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-19T20:02:13Z
dc.date.available2021-10-19T20:02:13Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19933
dc.source.beginpage79691T
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
dc.title

Impact of mask line roughness in EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
21278.pdf
Size:
538.12 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions