Publication:

New lithographic requirements for the implant levels in scaled devices

Date

2010
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorBaerts, Christina
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorErcken, Monique
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorErcken, Monique
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-18T23:26:54Z
dc.date.available2021-10-18T23:26:54Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18229
dc.source.conference36th International Conference on Micro & Nano Engineering - MNE
dc.source.conferencedate20/09/2010
dc.source.conferencelocationGenoa Italy
dc.title

New lithographic requirements for the implant levels in scaled devices

dc.typeOral presentation
dspace.entity.typePublication
Files

Original bundle

Name:
21070.pdf
Size:
1.94 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Presentations