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Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

Date

1996
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dc.contributor.authorVanhellemont, Jan
dc.contributor.authorServidori, M.
dc.contributor.authorHiggs, V.
dc.contributor.authorGramenova, Emilia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorJansen, Philippe
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-09-29T15:45:48Z
dc.date.available2021-09-29T15:45:48Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1616
dc.source.conferenceInternational Conference on Extended Defects in Semiconductors - EDS
dc.source.conferencedate8/09/1996
dc.source.conferencelocationGiens France
dc.title

Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

dc.typeOral presentation
dspace.entity.typePublication
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