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Effect of substrate roughness on the nucleation and growth behaviour of microwave plasma enhanced CVD diamond films - a case study

Date

2023
Journal article
https://doi.org/10.1080/26941112.2023.2295346
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dc.contributor.authorMallik, Awadesh
dc.contributor.authorRouzbahani Bayatani, Rozita
dc.contributor.authorLloret, Fernando
dc.contributor.authorMary Joy, Rani
dc.contributor.authorHaenen, Ken
dc.contributor.imecauthorMary Joy, Rani
dc.contributor.imecauthorHaenen, Ken
dc.contributor.imecauthorMallik, Awadesh
dc.contributor.imecauthorRouzbahani Bayatani, Rozita
dc.contributor.orcidimecMary Joy, Rani::0000-0001-8741-4908
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.contributor.orcidimecRouzbahani Bayatani, Rozita::0000-0001-5528-1434
dc.date.accessioned2024-08-05T08:15:23Z
dc.date.available2024-08-02T18:07:48Z
dc.date.available2024-08-05T08:15:23Z
dc.date.issued2023
dc.description.wosFundingTextThis work was financially supported by the Methusalem NANO network and the Research Foundation - Flanders (FWO) via project G0D4920N. AKM acknowledges FWO for his Postdoctoral Fellowship with grant no. 12X2919N.
dc.identifier.doi10.1080/26941112.2023.2295346
dc.identifier.issn2694-1112
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44246
dc.publisherTAYLOR & FRANCIS LTD
dc.source.beginpageArticle: 2295346
dc.source.endpageN/A
dc.source.issue1
dc.source.journalFUNCTIONAL DIAMOND
dc.source.numberofpages15
dc.source.volume3
dc.subject.keywordsSURFACE-ROUGHNESS
dc.subject.keywordsHETEROGENEOUS NUCLEATION
dc.subject.keywordsSILICON
dc.subject.keywordsTOPOGRAPHY
dc.subject.keywordsCOATINGS
dc.subject.keywordsDENSITY
dc.title

Effect of substrate roughness on the nucleation and growth behaviour of microwave plasma enhanced CVD diamond films - a case study

dc.typeJournal article
dspace.entity.typePublication
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