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Implementing full field EUV lithography using the ADT
Publication:
Implementing full field EUV lithography using the ADT
Date
2008
Proceedings Paper
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16958.pdf
3.97 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Hendrickx, Eric
;
Jonckheere, Rik
;
Lorusso, Gian
;
Baudemprez, Bart
;
Hermans, Jan
;
Laidler, David
;
Niroomand, Ardavan
;
Van Roey, Frieda
;
van Dijk, Andre
;
Romijn, Leon
;
Stepanenko, Nickolay
;
Timoshkov, Vadim
;
Iwamoto, Fumio
;
Myers, Alan
;
Hyun, Yoonsuk
;
Lim, Changmoon
;
Pollentier, Ivan
;
Leeson, Michael
;
de Marneffe, Jean-Francois
;
Demuynck, Steven
;
Ronse, Kurt
Journal
Abstract
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1890
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1890
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations