Electrochemical nucleation and growth of copper on resistive substrates

dc.contributor.author	Radisic, Alex
dc.contributor.author	Boelen, Pieter
dc.contributor.author	Rosenfeld, Aron
dc.contributor.author	Hernandez, Jose Luis
dc.contributor.author	Beyer, Gerald
dc.contributor.author	Vereecken, Philippe
dc.contributor.imecauthor	Radisic, Alex
dc.contributor.imecauthor	Hernandez, Jose Luis
dc.contributor.imecauthor	Beyer, Gerald
dc.contributor.imecauthor	Vereecken, Philippe
dc.contributor.orcidimec	Vereecken, Philippe::0000-0003-4115-0075
dc.date.accessioned	2021-10-17T10:02:21Z
dc.date.available	2021-10-17T10:02:21Z
dc.date.issued	2008
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14349
dc.identifier.url	http://ecsdl.aip.org/vsearch/servlet/VerityServlet?KEY=ECSTF8&smode=strresults&CURRENT=&ONLINE=&SMODE=&ver=&sti=&arttype=&pjourn
dc.source.beginpage	25
dc.source.conference	Electrodeposition of Nanoengineered Materials and Alloys 2
dc.source.conferencedate	7/10/2007
dc.source.conferencelocation	Washington, DC USA
dc.source.endpage	33
dc.title	Electrochemical nucleation and growth of copper on resistive substrates
dc.type	Proceedings paper
dspace.entity.type	Publication
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