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Impact of extreme UV mask flatness on resist roughness
Publication:
Impact of extreme UV mask flatness on resist roughness
Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Younkin, Todd
;
Leeson, Michael
;
Pei-Yang, Yan
Journal
Abstract
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1932
since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations
Metrics
Views
1932
since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations