Publication:
Study of multilayer defects on sub-32nm HP EUV reticles
Date
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Bret, Tristan | |
| dc.contributor.author | Waiblinger, Markus | |
| dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-10-20T17:35:07Z | |
| dc.date.available | 2021-10-20T17:35:07Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21688 | |
| dc.identifier.url | www.sematech.org/10258/ | |
| dc.source.conference | International Symposium on Extreme Ultraviolet Lithography - EUVL | |
| dc.source.conferencedate | 1/10/2012 | |
| dc.source.conferencelocation | Brussels Belgium | |
| dc.title | Study of multilayer defects on sub-32nm HP EUV reticles | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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