Publication:
Highly scalable bulk FinFET devices with multi-VT options by conductive metal gate stack tuning for the 10-nm node and beyond
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Acq. date: 2026-01-25
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Acq. date: 2026-01-25
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1 since deposited on 2021-10-22
Acq. date: 2026-01-25
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2038 since deposited on 2021-10-22
3last month
2last week
Acq. date: 2026-01-25
Citations