Publication:
Demonstration of fully Ni-silicided metal gates on HfO2 based high-k gate dielectrics as a candidate for low power applications
Date
Loading...
Journal
Abstract
Description
Statistics
Views
1890 since deposited on 2021-10-15
1last month
Acq. date: 2026-03-17
Citations
Statistics
Views
1890 since deposited on 2021-10-15
1last month
Acq. date: 2026-03-17
Citations