The study of effective work function modulation by As ion implantation in TiN/TaN/HfO2 stacks.

Publication:

2007

Journal article

Author(s)

Singanamalla, Raghunath

;

Yu, HongYu

;

Janssens, Tom

;

Kubicek, Stefan

;

Japanese Journal of Applied Physics. Part 2: Letters

1806 since deposited on 2021-10-16

Acq. date: 2026-09-22