Publication:
Process window discovery, expansion and control of design hotspots susceptible to overlay failures
Date
| dc.contributor.author | Sah, Kaushik | |
| dc.contributor.author | Cross, Andrew | |
| dc.contributor.author | Mani, Antonio | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Foubert, Philippe | |
| dc.contributor.imecauthor | Sah, Kaushik | |
| dc.contributor.imecauthor | Cross, Andrew | |
| dc.contributor.imecauthor | Mani, Antonio | |
| dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
| dc.contributor.imecauthor | Foubert, Philippe | |
| dc.date.accessioned | 2021-10-24T12:40:32Z | |
| dc.date.available | 2021-10-24T12:40:32Z | |
| dc.date.issued | 2017 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/29350 | |
| dc.identifier.url | https://ieeexplore.ieee.org/document/7969272/ | |
| dc.source.conference | 28th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC | |
| dc.source.conferencedate | 15/05/2017 | |
| dc.source.conferencelocation | Saratoga Springs, NY USA | |
| dc.title | Process window discovery, expansion and control of design hotspots susceptible to overlay failures | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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