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Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition

Date

2010
Proceedings Paper
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dc.contributor.authorMortet, Vincent
dc.contributor.authorZhang, Liang
dc.contributor.authorEchert, Maxie
dc.contributor.authorSoltani, Ali
dc.contributor.authorD'Haen, Jan
dc.contributor.authorDouheret, Olivier
dc.contributor.authorMoreau, Myriam
dc.contributor.authorOsswald, Sebastian
dc.contributor.authorNeyts, Erik
dc.contributor.authorTroadec, David
dc.contributor.authorWagner, Patrick
dc.contributor.authorBogaerts, Annemie
dc.contributor.authorVan Tendeloo, Gustaaf
dc.contributor.authorHaenen, Ken
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.date.accessioned2021-10-18T19:19:20Z
dc.date.available2021-10-18T19:19:20Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17657
dc.source.beginpage1203-J05-03
dc.source.conferenceDiamond Electronics and Bioelectronics - Fundamentals to Applications III
dc.source.conferencedate30/11/2009
dc.source.conferencelocationBoston, MA USA
dc.title

Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition

dc.typeProceedings paper
dspace.entity.typePublication
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