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Metal hard-mask based double patterning for 22nm and beyond
Publication:
Metal hard-mask based double patterning for 22nm and beyond
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Date
2010
Proceedings Paper
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19928.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Struyf, Herbert
;
de Marneffe, Jean-Francois
;
Goossens, Danny
;
Hendrickx, Dirk
;
Huffman, Craig
;
Kunnen, Eddy
;
Lazzarino, Frederic
;
Milenin, Alexey
;
Shamiryan, Denis
;
Urbanowicz, Adam
;
Vandervorst, Alain
;
Boullart, Werner
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1895
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-10
Citations