Publication:

Supercritical CO2 etching of metal thin films for magnetoresistive memory processing

Date

2015
Meeting abstract
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dc.contributor.authorRasadujjaman, M
dc.contributor.authorNakamura, Y.
dc.contributor.authorWatanabe, M.
dc.contributor.authorKondoh, E.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T22:08:11Z
dc.date.available2021-10-22T22:08:11Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25803
dc.source.conference41st Micro and Nanoengineering Conference - MNE
dc.source.conferencedate21/09/2015
dc.source.conferencelocationDelft Nederlands
dc.title

Supercritical CO2 etching of metal thin films for magnetoresistive memory processing

dc.typeMeeting abstract
dspace.entity.typePublication
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