Publication:
NBTI in replacement metal gate SiGe core finFETs: impact of Ge concentration, fin width, fin rotation and interface passivation by high pressure anneal
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Acq. date: 2026-02-28
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Acq. date: 2026-02-28
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1 since deposited on 2021-10-23
Acq. date: 2026-02-28
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1900 since deposited on 2021-10-23
2last month
Acq. date: 2026-02-28
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