Publication:

Dry etching process for bulk finFET manufacturing

Date

2009
Journal article
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dc.contributor.authorShamiryan, Denis
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-18T02:57:06Z
dc.date.available2021-10-18T02:57:06Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16209
dc.source.beginpage96
dc.source.endpage98
dc.source.issue1
dc.source.journalMicroelectronic Engineering
dc.source.volume86
dc.title

Dry etching process for bulk finFET manufacturing

dc.typeJournal article
dspace.entity.typePublication
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