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Shallow boron implantations in Ge and the role of the pre-amorphization depth
Publication:
Shallow boron implantations in Ge and the role of the pre-amorphization depth
Date
2008
Journal article
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19499.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Simoen, Eddy
;
Brouwers, Gijs
;
Satta, Alessandra
;
David, M.L.
;
Pailloux, F.
;
Parmentier, Brigitte
;
Clarysse, Trudo
;
Goossens, Jozefien
;
Vandervorst, Wilfried
;
Meuris, Marc
Journal
Materials Science in Semiconductor Processing
Abstract
Description
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1949
since deposited on 2021-10-17
427
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1949
since deposited on 2021-10-17
427
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations