Publication:
Sputter rate variations in silicon under high-k dielectric films
Date
| dc.contributor.author | Bennett, J. | |
| dc.contributor.author | Beebe, M. | |
| dc.contributor.author | Sparks, C. | |
| dc.contributor.author | Gondran, C. | |
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.date.accessioned | 2021-10-15T12:42:32Z | |
| dc.date.available | 2021-10-15T12:42:32Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8565 | |
| dc.source.beginpage | 565 | |
| dc.source.endpage | 568 | |
| dc.source.journal | Applied Surface Science | |
| dc.source.volume | 231-232 | |
| dc.title | Sputter rate variations in silicon under high-k dielectric films | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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