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Enabling CD SEM metrology for 5nm technology node and beyond
Publication:
Enabling CD SEM metrology for 5nm technology node and beyond
Date
2017
Proceedings Paper
https://doi.org/10.1117/12.2257468
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37296.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lorusso, Gian
;
Ohashi, Takeyoshi
;
Yamaguchi, Astuko
;
Inoue, Osamu
;
Sutani, Takumichi
;
Horiguchi, Naoto
;
Boemmels, Juergen
;
Wilson, Chris
;
Briggs, Basoene
;
Tan, Chi Lim
;
Raymaekers, Tom
;
Delhougne, Romain
;
Van den Bosch, Geert
;
Di Piazza, Luca
;
Kar, Gouri Sankar
;
Furnemont, Arnaud
;
Fantini, Andrea
;
Donadio, Gabriele Luca
;
Souriau, Laurent
;
Crotti, Davide
;
Yasin, Farrukh
;
Appeltans, Raf
;
Rao, Siddharth
;
De Simone, Danilo
;
Rincon Delgadillo, Paulina
;
Leray, Philippe
;
Charley, Anne-Laure
;
Zhou, Daisy
;
Veloso, Anabela
;
Collaert, Nadine
;
Hasumi, Kazuhisa
;
Koshihara, Shunsuke
;
Ikota, Masami
;
Okagawa, Yutaka
;
Ishimoto, Toru
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1997
since deposited on 2021-10-24
Acq. date: 2025-10-22
Citations
Metrics
Views
1997
since deposited on 2021-10-24
Acq. date: 2025-10-22
Citations