Publication:

Further investigation of EUV process sensitivities for wafer track processing

Date

2010
Proceedings Paper
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dc.contributor.authorBradon, Neil
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShite, Hideo
dc.contributor.authorKitano, J.
dc.contributor.authorKosugi, H.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorCheng, Shaunee
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-18T15:25:03Z
dc.date.available2021-10-18T15:25:03Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16788
dc.source.beginpage763630
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
dc.title

Further investigation of EUV process sensitivities for wafer track processing

dc.typeProceedings paper
dspace.entity.typePublication
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