Publication:

A new high-rate deposition method for thin film crystalline Si solar cells

Date

2002
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorSharafutdinov, R.
dc.contributor.authorKhmel, S.
dc.contributor.authorSemenova, O.
dc.contributor.authorSvitasheva, S.
dc.contributor.authorBilyalov, Renat
dc.contributor.authorPoortmans, Jef
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-14T23:09:16Z
dc.date.available2021-10-14T23:09:16Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6822
dc.source.beginpage1178
dc.source.conference29th IEEE Photovoltaic Specialists Conference
dc.source.conferencedate20/05/2002
dc.source.conferencelocationNew Orleans, LA USA
dc.source.endpage1181
dc.title

A new high-rate deposition method for thin film crystalline Si solar cells

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
6790.pdf
Size:
337.91 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions