Publication:

Physical characterization of high-k gate stacks deposited on HF-last surfaces

Date

2001
Proceedings Paper
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Author(s)

Bender, Hugo  
;
Conard, Thierry  
;
Nohira, Hiroshi
;
Pétry, Jasmine
;
Richard, Olivier  
;
Zhao, Chao
;
Brijs, Bert
;
Besling, Wim
;
Detavernier, C.
;
Vandervorst, Wilfried  
;
Caymax, Matty  
;
De Gendt, Stefan  
;
Chen, Jian
;
Kluth, Jon
;
Tsai, Wilman
;
Maes, Jos

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Abstract

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