Physical characterization of high-k gate stacks deposited on HF-last surfaces

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Author(s)

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Conard, Thierry

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Nohira, Hiroshi

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Pétry, Jasmine

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Richard, Olivier

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Detavernier, C.

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Vandervorst, Wilfried

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De Gendt, Stefan

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Metrics

1909 since deposited on 2021-10-14

Acq. date: 2025-10-23