Publication:
Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization
| dc.contributor.author | Pellens, Nick | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.imecauthor | Pellens, Nick | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.orcidimec | Pellens, Nick::0000-0001-5527-5130 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.contributor.orcidimec | Hendrickx, Eric::0000-0003-2516-0417 | |
| dc.date.accessioned | 2025-07-07T09:13:54Z | |
| dc.date.available | 2025-05-11T05:43:41Z | |
| dc.date.available | 2025-07-07T09:13:54Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/12.3033432 | |
| dc.identifier.eisbn | 978-1-5106-8156-9 | |
| dc.identifier.isbn | 978-1-5106-8155-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45649 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | Art. 1321505 | |
| dc.source.conference | 2024 International Conference on Extreme Ultraviolet Lithography | |
| dc.source.conferencedate | SEP 30-OCT 03, 2024 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 14 | |
| dc.source.volume | 13215 | |
| dc.title | Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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