Ultra high amorphous silicon passivation quality of crystalline silicon surface using in-situ post-deposition treatments

dc.contributor.author	Meddeb, Hosny
dc.contributor.author	Bearda, Twan
dc.contributor.author	Dimassi, Wissem
dc.contributor.author	Abdulraheem, Yaser
dc.contributor.author	Ezzaouia, Hatem
dc.contributor.author	Gordon, Ivan
dc.contributor.author	Szlufcik, Jozef
dc.contributor.author	Poortmans, Jef
dc.contributor.imecauthor	Gordon, Ivan
dc.contributor.imecauthor	Szlufcik, Jozef
dc.contributor.imecauthor	Poortmans, Jef
dc.contributor.orcidimec	Gordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimec	Poortmans, Jef::0000-0003-2077-2545
dc.date.accessioned	2021-10-22T21:00:52Z
dc.date.available	2021-10-22T21:00:52Z
dc.date.embargo	9999-12-31
dc.date.issued	2015
dc.identifier.issn	1862-6254
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/25632
dc.identifier.url	http://onlinelibrary.wiley.com/doi/10.1002/pssr.201409494/abstract
dc.source.beginpage	53
dc.source.endpage	56
dc.source.issue	1
dc.source.journal	Physica Status Solidi. Rapid Research Letters
dc.source.volume	9
dc.title	Ultra high amorphous silicon passivation quality of crystalline silicon surface using in-situ post-deposition treatments
dc.type	Journal article
dspace.entity.type	Publication
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