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In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

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dc.contributor.authorLiebens, Maarten
dc.contributor.imecauthorLiebens, Maarten
dc.date.accessioned2021-10-27T12:43:00Z
dc.date.available2021-10-27T12:43:00Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33447
dc.source.bookSEMICON Korea Magazine
dc.title

In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

dc.typeBook chapter
dspace.entity.typePublication
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