Publication:
Dual silicide technology: WSix polycide gate and self-aligned CoSi2 source/drain
Date
Loading...
Files
Journal
Abstract
Description
Statistics
Views
2007 since deposited on 2021-09-29
1last month
Acq. date: 2026-07-17
Citations
Statistics
Views
2007 since deposited on 2021-09-29
1last month
Acq. date: 2026-07-17
Citations