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Dual silicide technology: WSix polycide gate and self-aligned CoSi2 source/drain
Publication:
Dual silicide technology: WSix polycide gate and self-aligned CoSi2 source/drain
Date
1994
Proceedings Paper
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155.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franssila, Samuli
;
Palmans, Roger
;
Stone, M.
;
Maex, Karen
Journal
Abstract
Description
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1995
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
1995
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations