Publication:
Dual silicide technology: WSix polycide gate and self-aligned CoSi2 source/drain
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2001 since deposited on 2021-09-29
1last month
Acq. date: 2026-02-26
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Statistics
Views
2001 since deposited on 2021-09-29
1last month
Acq. date: 2026-02-26
Citations