Publication:

Dual silicide technology: WSix polycide gate and self-aligned CoSi2 source/drain

Date

Loading...
Thumbnail Image

Abstract

Description

Statistics

Views

2009 since deposited on 2021-09-29
3last month
1last week
Acq. date: 2026-08-08

Citations

Statistics

Views

2009 since deposited on 2021-09-29
3last month
1last week
Acq. date: 2026-08-08

Citations