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MOCVD growth of 2D WS2 on SiO2: nucleation mechanism and kinetics

Date

2019
Meeting abstract
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dc.contributor.authorCaymax, Matty
dc.contributor.authorEl Kazzi, Salim
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.date.accessioned2021-10-27T07:52:51Z
dc.date.available2021-10-27T07:52:51Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32659
dc.source.beginpage159
dc.source.conferenceInternational Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate2/09/2019
dc.source.conferencelocationNagoya Japan
dc.source.endpage160
dc.title

MOCVD growth of 2D WS2 on SiO2: nucleation mechanism and kinetics

dc.typeMeeting abstract
dspace.entity.typePublication
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